Substrate bias effects on the deposition process of amorphous carbon films were investigated by using infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS). The density of the sp-CH species was increased in amorphous carbon films with substrate bias; on the other hand, the density of the sp3-CHX (X=1～3) species was decreased in amorphous carbon films with substrate bias.
内容記述
ナノダイナミクス国際シンポジウム 平成20年1月45日(木) 於長崎大学
Nagasaki Symposium on Nano-Dynamics 2009 (NSND2009), January 27, 2021, Nagasaki University, Nagasaki, Japan, Poster Presentation
Substrate Bias Effect on Deposition Process of Amorphous Carbon Films
NSND2009_P13.pdf
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