{"created":"2023-05-15T16:39:11.067026+00:00","id":13053,"links":{},"metadata":{"_buckets":{"deposit":"503a04e0-b33c-499b-8417-880c0ccb20a2"},"_deposit":{"created_by":2,"id":"13053","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"13053"},"status":"published"},"_oai":{"id":"oai:nagasaki-u.repo.nii.ac.jp:00013053","sets":["14:65"]},"author_link":["47528","47527","47526","47529","47525"],"item_9_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2010-11","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"1006","bibliographicPageStart":"1002","bibliographic_titles":[{"bibliographic_title":"TENCON 2010 - 2010 IEEE Region 10 Conference"}]}]},"item_9_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Aluminum-doped zinc oxide (AZO) is one of the promising transparent conductive oxide materials, which is expected to be an alternative to tin-doped indium oxide (ITO) that for long has been widely used in industry. The authors have been engaged in the development of AZO deposition process using inductively-coupled plasma assisted sputtering in a couple of years. This paper reports the results showing effectiveness of inductively coupled plasma (ICP) assisted sputtering in AZO film deposition process.","subitem_description_type":"Abstract"}]},"item_9_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"2010 IEEE Region 10 Conference (TENCON 2010) : Fukuoka, 2010.11.21-2010.11.24","subitem_description_type":"Other"}]},"item_9_description_63":{"attribute_name":"引用","attribute_value_mlt":[{"subitem_description":"TENCON 2010, pp.1002-1006; 2010","subitem_description_type":"Other"}]},"item_9_publisher_33":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"IEEE"}]},"item_9_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1109/TENCON.2010.5686462","subitem_relation_type_select":"DOI"}}]},"item_9_relation_9":{"attribute_name":"ISBN","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"978-1-4244-6889-8","subitem_relation_type_select":"ISBN"}}]},"item_9_rights_13":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"© 2010 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE."}]},"item_9_version_type_16":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Shindo, Ryota"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Iwata, Tadashi"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Hirashima, Akinori"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Shinohara, Masanori"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Matsuda, Yoshinobu"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-12-22"}],"displaytype":"detail","filename":"TENCON2010_1002.pdf","filesize":[{"value":"311.4 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"TENCON2010_1002.pdf","url":"https://nagasaki-u.repo.nii.ac.jp/record/13053/files/TENCON2010_1002.pdf"},"version_id":"0f168188-45d0-49a5-8dc6-61fac91828bd"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Inductively-coupled plasma","subitem_subject_scheme":"Other"},{"subitem_subject":"Optical spectroscopy","subitem_subject_scheme":"Other"},{"subitem_subject":"Sputtering","subitem_subject_scheme":"Other"},{"subitem_subject":"Transparent conducting oxide films","subitem_subject_scheme":"Other"},{"subitem_subject":"Zinc oxide","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference paper","resourceuri":"http://purl.org/coar/resource_type/c_5794"}]},"item_title":"Deposition of transparent conducting Al-doped ZnO thin films by ICP-assisted sputtering","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Deposition of transparent conducting Al-doped ZnO thin films by ICP-assisted sputtering"}]},"item_type_id":"9","owner":"2","path":["65"],"pubdate":{"attribute_name":"公開日","attribute_value":"2011-05-17"},"publish_date":"2011-05-17","publish_status":"0","recid":"13053","relation_version_is_last":true,"title":["Deposition of transparent conducting Al-doped ZnO thin films by ICP-assisted sputtering"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-05-16T00:44:49.376634+00:00"}