@inproceedings{oai:nagasaki-u.repo.nii.ac.jp:00013054,
 author = {Kitagawa, Hiroaki and Kan, Ryoji and Mine, Kenji and Shinohara, Masanori and Matsuda, Yoshinobu},
 book = {TENCON 2010 - 2010 IEEE Region 10 Conference},
 month = {Nov},
 note = {Substrate energy flux in the inductively coupled plasma (ICP) assisted magnetron discharge has been measured by using a home-made thermal probe. The energy flux depends predominantly on the ICP power. In addition, substrate bias dependence of the substrate energy flux has been measured. As a result, it has been confirmed that the measured heat influx in an ICP is in good agreement with the theoretically calculated value within 30% error. Thus, substrate energy flux during the ICP assisted sputtering is quantitatively clarified., 2010 IEEE Region 10 Conference (TENCON 2010) : Fukuoka, 2010.11.21-2010.11.24, TENCON 2010, pp.2208-2212; 2010},
 pages = {2208--2212},
 publisher = {IEEE},
 title = {Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition},
 year = {2010}
}