{"created":"2023-05-15T16:39:11.108992+00:00","id":13054,"links":{},"metadata":{"_buckets":{"deposit":"f4c8b8cd-0886-4f89-98ff-16a0127ff469"},"_deposit":{"created_by":2,"id":"13054","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"13054"},"status":"published"},"_oai":{"id":"oai:nagasaki-u.repo.nii.ac.jp:00013054","sets":["14:65"]},"author_link":["47531","47534","47533","47532","47530"],"item_9_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2010-11","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"2212","bibliographicPageStart":"2208","bibliographic_titles":[{"bibliographic_title":"TENCON 2010 - 2010 IEEE Region 10 Conference"}]}]},"item_9_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Substrate energy flux in the inductively coupled plasma (ICP) assisted magnetron discharge has been measured by using a home-made thermal probe. The energy flux depends predominantly on the ICP power. In addition, substrate bias dependence of the substrate energy flux has been measured. As a result, it has been confirmed that the measured heat influx in an ICP is in good agreement with the theoretically calculated value within 30% error. Thus, substrate energy flux during the ICP assisted sputtering is quantitatively clarified.","subitem_description_type":"Abstract"}]},"item_9_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"2010 IEEE Region 10 Conference (TENCON 2010) : Fukuoka, 2010.11.21-2010.11.24","subitem_description_type":"Other"}]},"item_9_description_63":{"attribute_name":"引用","attribute_value_mlt":[{"subitem_description":"TENCON 2010, pp.2208-2212; 2010","subitem_description_type":"Other"}]},"item_9_publisher_33":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"IEEE"}]},"item_9_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1109/TENCON.2010.5686695","subitem_relation_type_select":"DOI"}}]},"item_9_relation_9":{"attribute_name":"ISBN","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"978-1-4244-6889-8","subitem_relation_type_select":"ISBN"}}]},"item_9_rights_13":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"© 2010 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE."}]},"item_9_version_type_16":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kitagawa, Hiroaki"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kan, Ryoji"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Mine, Kenji"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Shinohara, Masanori"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Matsuda, Yoshinobu"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-12-22"}],"displaytype":"detail","filename":"TENCON2010_2208.pdf","filesize":[{"value":"287.4 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"TENCON2010_2208.pdf","url":"https://nagasaki-u.repo.nii.ac.jp/record/13054/files/TENCON2010_2208.pdf"},"version_id":"06d9a4fb-1287-4cfd-b7b5-a8a0202bf029"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Energy flux","subitem_subject_scheme":"Other"},{"subitem_subject":"Inductively coupled plasma","subitem_subject_scheme":"Other"},{"subitem_subject":"Thermal probe","subitem_subject_scheme":"Other"},{"subitem_subject":"Transparent conductive film","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference paper","resourceuri":"http://purl.org/coar/resource_type/c_5794"}]},"item_title":"Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition"}]},"item_type_id":"9","owner":"2","path":["65"],"pubdate":{"attribute_name":"公開日","attribute_value":"2011-05-17"},"publish_date":"2011-05-17","publish_status":"0","recid":"13054","relation_version_is_last":true,"title":["Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-05-16T00:44:47.536373+00:00"}