{"created":"2023-05-15T16:39:59.428633+00:00","id":14073,"links":{},"metadata":{"_buckets":{"deposit":"f8597936-0c01-45bc-8dd4-43d808c62dee"},"_deposit":{"created_by":2,"id":"14073","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"14073"},"status":"published"},"_oai":{"id":"oai:nagasaki-u.repo.nii.ac.jp:00014073","sets":["14:21"]},"author_link":["50515"],"item_2_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2010-08","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageEnd":"S28","bibliographicPageStart":"S23","bibliographicVolumeNumber":"59","bibliographic_titles":[{"bibliographic_title":"Journal of Electron Microscopy"}]}]},"item_2_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"In a Bloch-wave-based STEM image simulation, a framework for calculating the cross section for any incoherent scattering process was formulated by Allen et al. [(2003) Lattice-resolution contrast from a focused coherent electron probe. Part I. Ultramicroscopy 96: 47-63; Part II. ibid. 96: 65-81]. They simulated the high-angle annular dark-field, back-scattered electron, electron energy-loss spectroscopy and energy-dispersive X-ray (EDX) STEM images from the inelastic scattering coefficients. Furthermore, a skilful approach for deriving the excitation amplitude and block diagonalization in the eigenvalue equation was employed to reduce computing time and memory. In the present work, I extended their scheme to a layer-by-layer representation for application to inhomogeneous crystals. Calculations for a multi-layer Si sample including a displaced layer were performed by multiplying Allen et al.'s block-diagonalized matrices. Electron intensities within the sample and EDX STEM images were calculated at various conditions. From the calculations, three-dimensional STEM analysis was considered.","subitem_description_type":"Abstract"}]},"item_2_description_63":{"attribute_name":"引用","attribute_value_mlt":[{"subitem_description":"Journal of Electron Microscopy, 59(1), pp.S23-S28; 2010","subitem_description_type":"Other"}]},"item_2_relation_11":{"attribute_name":"PubMed番号","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"20573745","subitem_relation_type_select":"PMID"}}]},"item_2_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1093/jmicro/dfq028","subitem_relation_type_select":"DOI"}}]},"item_2_rights_13":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"© The Author 2010. Published by Oxford University Press on behalf of Japanese Society of Microscopy. All rights reserved. For permissions, please e-mail: journals.permissions@oxfordjournals.org"},{"subitem_rights":"This is a pre-copy-editing, author-produced PDF of an article accepted for publication in Journal of electron microscopy following peer review. The definitive publisher-authenticated version Journal of electron microscopy, 59(1), pp.S23-S28; 2010 is available online at: http://jmicro.oxfordjournals.org/content/59/S1/S23."}]},"item_2_source_id_10":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA00697060","subitem_source_identifier_type":"NCID"}]},"item_2_source_id_7":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"00220744","subitem_source_identifier_type":"ISSN"}]},"item_2_source_id_8":{"attribute_name":"EISSN","attribute_value_mlt":[{"subitem_source_identifier":"14779986","subitem_source_identifier_type":"ISSN"}]},"item_2_version_type_16":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Morimura, Takao"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-12-22"}],"displaytype":"detail","filename":"JEM59_S23.pdf","filesize":[{"value":"1.1 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"JEM59_S23.pdf","url":"https://nagasaki-u.repo.nii.ac.jp/record/14073/files/JEM59_S23.pdf"},"version_id":"729ab757-6b42-4e4a-89dc-4be130eaa069"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Bethe equation","subitem_subject_scheme":"Other"},{"subitem_subject":"Bloch-wave method","subitem_subject_scheme":"Other"},{"subitem_subject":"EDX","subitem_subject_scheme":"Other"},{"subitem_subject":"inelastic electron scattering","subitem_subject_scheme":"Other"},{"subitem_subject":"layer-by-layer","subitem_subject_scheme":"Other"},{"subitem_subject":"STEM","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"STEM image simulation by Bloch-wave method with layer-by-layer representation.","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"STEM image simulation by Bloch-wave method with layer-by-layer representation."}]},"item_type_id":"2","owner":"2","path":["21"],"pubdate":{"attribute_name":"公開日","attribute_value":"2011-09-01"},"publish_date":"2011-09-01","publish_status":"0","recid":"14073","relation_version_is_last":true,"title":["STEM image simulation by Bloch-wave method with layer-by-layer representation."],"weko_creator_id":"2","weko_shared_id":2},"updated":"2023-05-15T19:02:31.590388+00:00"}