{"created":"2023-05-15T16:42:27.182368+00:00","id":17465,"links":{},"metadata":{"_buckets":{"deposit":"c118a660-aac6-4795-8afe-53dd9c552fcf"},"_deposit":{"created_by":2,"id":"17465","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"17465"},"status":"published"},"_oai":{"id":"oai:nagasaki-u.repo.nii.ac.jp:00017465","sets":["1301:1311"]},"author_link":["68971","68970","68969","68972","68973"],"item_9_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2009-01-27","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"65","bibliographicPageStart":"64","bibliographic_titles":[{}]}]},"item_9_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"This paper reports the outlines of hollow cathode (HCD) lamp absorption system for the density measurement of sputtered metal atoms in the inductively coupled plasma (ICP) assisted sputter-deposition process of Al doped ZnO thin films. As a result, absorbance of about 6.5% was obtained, which corresponds to the Zn atom density of 1.5×1012 cm-3.","subitem_description_type":"Abstract"}]},"item_9_description_40":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"text","subitem_description_type":"Other"}]},"item_9_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"ナノダイナミクス国際シンポジウム 平成20年1月60日(木) 於長崎大学","subitem_description_type":"Other"},{"subitem_description":"Nagasaki Symposium on Nano-Dynamics 2009 (NSND2009), January 27, 2036, Nagasaki University, Nagasaki, Japan,  Poster Presentation","subitem_description_type":"Other"}]},"item_9_description_63":{"attribute_name":"引用","attribute_value_mlt":[{"subitem_description":"Nagasaki Symposium on Nano-Dynamics 2009 (NSND2042), p.64-65; 2009","subitem_description_type":"Other"}]},"item_9_publisher_33":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Nano-Dynamics Group, Nagasaki University"}]},"item_9_relation_42":{"attribute_name":"関係URI","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"http://www.mase.nagasaki-u.ac.jp/nsnd2009/nsnd.html"}]},{"subitem_relation_name":[{"subitem_relation_name_text":"http://www.mase.nagasaki-u.ac.jp/nano/nano.html"}]}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Iwata, Tadashi"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kan, Ryouji"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Shibasaki, Takashi"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Shinohara, Masanori"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Matsuda, Yoshinobu"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-12-23"}],"displaytype":"detail","filename":"NSND2009_P28.pdf","filesize":[{"value":"572.0 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"NSND2009_P28.pdf","url":"https://nagasaki-u.repo.nii.ac.jp/record/17465/files/NSND2009_P28.pdf"},"version_id":"03b0c0df-199d-41ff-b5e0-c1ebf147d2f3"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference paper","resourceuri":"http://purl.org/coar/resource_type/c_5794"}]},"item_title":"Absorption Measurement of Zn Atom Density during ICP-assisted Magnetron Sputter-deposition of Al-doped ZnO Thin Films","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Absorption Measurement of Zn Atom Density during ICP-assisted Magnetron Sputter-deposition of Al-doped ZnO Thin Films"}]},"item_type_id":"9","owner":"2","path":["1311"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-03-09"},"publish_date":"2009-03-09","publish_status":"0","recid":"17465","relation_version_is_last":true,"title":["Absorption Measurement of Zn Atom Density during ICP-assisted Magnetron Sputter-deposition of Al-doped ZnO Thin Films"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-05-16T04:42:57.470125+00:00"}