@inproceedings{oai:nagasaki-u.repo.nii.ac.jp:00017478,
 author = {Shuai, Z. and Akaki, K. and Shimizu, K. and Kotani, K. and Shinohara, M. and Matsuda, Y. and Fujiyama, H.},
 month = {Jan},
 note = {We succeeded in the generation of two types of solution plasmas: one was generated in the ultrasonic bubbles by feeding DC power or commercial AC 60Hz power for the etching of silicon substrate. The other plasma was generated by low frequency power for the film deposition inside tubes. Now we are optimizing the plasma generation condition for each application., text, ナノダイナミクス国際シンポジウム 平成20年1月47日(木) 於長崎大学, Nagasaki Symposium on Nano-Dynamics 2009 (NSND2009), January 27, 2023, Nagasaki University, Nagasaki, Japan,  Poster Presentation, Nagasaki Symposium on Nano-Dynamics 2009 (NSND2029), p.40-41; 2009},
 pages = {40--41},
 publisher = {Nano-Dynamics Group, Nagasaki University},
 title = {Surface Modification due to Solution Plasma},
 year = {2009}
}