{"created":"2023-05-15T16:42:27.832047+00:00","id":17480,"links":{},"metadata":{"_buckets":{"deposit":"d17f3fac-9936-4bf3-b2e9-216be5709792"},"_deposit":{"created_by":2,"id":"17480","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"17480"},"status":"published"},"_oai":{"id":"oai:nagasaki-u.repo.nii.ac.jp:00017480","sets":["1301:1311"]},"author_link":["69028","69027","69031","69029","69026","69032","69030"],"item_9_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2009-01-27","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"37","bibliographicPageStart":"36","bibliographic_titles":[{}]}]},"item_9_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Substrate bias effects on the deposition process of amorphous carbon films were investigated by using infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS). The density of the sp-CH species was increased in amorphous carbon films with substrate bias; on the other hand, the density of the sp3-CHX (X=1～3) species was decreased in amorphous carbon films with substrate bias.","subitem_description_type":"Abstract"}]},"item_9_description_40":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"text","subitem_description_type":"Other"}]},"item_9_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"ナノダイナミクス国際シンポジウム 平成20年1月45日(木) 於長崎大学","subitem_description_type":"Other"},{"subitem_description":"Nagasaki Symposium on Nano-Dynamics 2009 (NSND2009), January 27, 2021, Nagasaki University, Nagasaki, Japan,  Poster Presentation","subitem_description_type":"Other"}]},"item_9_description_63":{"attribute_name":"引用","attribute_value_mlt":[{"subitem_description":"Nagasaki Symposium on Nano-Dynamics 2009 (NSND2027), p.36-37; 2009","subitem_description_type":"Other"}]},"item_9_publisher_33":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Nano-Dynamics Group, Nagasaki University"}]},"item_9_relation_42":{"attribute_name":"関係URI","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"http://www.mase.nagasaki-u.ac.jp/nsnd2009/nsnd.html"}]},{"subitem_relation_name":[{"subitem_relation_name_text":"http://www.mase.nagasaki-u.ac.jp/nano/nano.html"}]}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Inayoshi, Takanori"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kawazoe, Hiroki"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Shinohara, Masanori"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Matsuda, Yoshinobu"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Fujiyama, Hiroshi"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Nitta, Yuki"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Nakatani, Tatsuyuki"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-12-23"}],"displaytype":"detail","filename":"NSND2009_P13.pdf","filesize":[{"value":"457.0 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"NSND2009_P13.pdf","url":"https://nagasaki-u.repo.nii.ac.jp/record/17480/files/NSND2009_P13.pdf"},"version_id":"83a70821-3628-4314-b0ef-aa1741dcb2fd"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Acetylene plasma","subitem_subject_scheme":"Other"},{"subitem_subject":"Amorphous carbon film","subitem_subject_scheme":"Other"},{"subitem_subject":"Deposition process","subitem_subject_scheme":"Other"},{"subitem_subject":"Infrared spectroscopy","subitem_subject_scheme":"Other"},{"subitem_subject":"Substrate bias","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference paper","resourceuri":"http://purl.org/coar/resource_type/c_5794"}]},"item_title":"Substrate Bias Effect on Deposition Process of Amorphous Carbon Films","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Substrate Bias Effect on Deposition Process of Amorphous Carbon Films"}]},"item_type_id":"9","owner":"2","path":["1311"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-03-09"},"publish_date":"2009-03-09","publish_status":"0","recid":"17480","relation_version_is_last":true,"title":["Substrate Bias Effect on Deposition Process of Amorphous Carbon Films"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-05-16T04:41:14.998451+00:00"}