@article{oai:nagasaki-u.repo.nii.ac.jp:00021163,
 author = {小山, 悠 and 岩谷, 勝 and 篠原, 正典 and 松田, 良信 and 藤山, 寛},
 issue = {61},
 journal = {長崎大学工学部研究報告},
 month = {Jul},
 note = {Magnesium oxide thin films are now of great concern as electrode protection layer with very high secondary electron emission coefficient in the application such as plasma display panel (PDP). For the high-rate deposition of this material, we propose a new reactive sputtering process in which conventional planar magnetron discharges are assisted by the inductively coupled plasma. In this paper, the current status of the development of this facility is described. Experimental results of plasma diagnostics and thin film analysis are presented., 長崎大学工学部研究報告 Vol.33(61) p. 47-52, 2003},
 pages = {47--52},
 title = {MgO薄膜高速成膜のための誘導結合プラズマ支援反応性スパッタリング法の開発},
 volume = {33},
 year = {2003}
}