@article{oai:nagasaki-u.repo.nii.ac.jp:00021208,
 author = {小島, 裕爾 and 篠原, 正典 and 松田, 良信 and 藤山, 寛},
 issue = {64},
 journal = {長崎大学工学部研究報告},
 month = {Mar},
 note = {For the high-rate inside wall coating of narrow tubes with low melting temperature, production of high-density plasma inside the tube is required at as low pressure as possible. Chemical or physical vapor deposition using helicon plasma source is one of the candidates for this purpose. Thus, the helicon plasma source has been constructed in our laboratory. Using an external half-turn helical antenna of 10 cm long, argon helicon plasma with the maximum electron density of 8×10^<11>cm^<-3> has been created in a 5 cm diameter quartz tube at the pressure of 30mTorr, with the input RF (13.56MHz) power of 500W and the magnetic field of 500 Gauss., 長崎大学工学部研究報告 Vol.35(64) p. 23-27, 2005},
 pages = {23--27},
 title = {細管内壁コーティングのためのヘリコン波プラズマ源の開発},
 volume = {35},
 year = {2005}
}