@article{oai:nagasaki-u.repo.nii.ac.jp:00000633,
 author = {Nakano, Masaki and Takeichi, Sho and Yamaguchi, Takashi and Takashima, Keisuke and Yamashita, Akihiro and Yanai, Takeshi and Shinshi, Tadahiko and Fukunaga, Hirotoshi},
 issue = {SE},
 journal = {Japanese Journal of Applied Physics},
 month = {Dec},
 note = {We investigated the possibility of R (Nd or Pr)-Fe-B thick-film magnets applied to MEMS. First, an enhancement in the thickness of the Si oxide layer on a Si substrate enabled us to increase the adhesion force between the Si substrate and Nd-Fe-B film. Then, after depositing a glass buffer layer on the Si substrate to obtain a thicker Si oxide layer, we compared the mechanical characteristics and magnetic properties of both Pr-Fe-B and Nd-Fe-B films. As the thickness of the glass buffer layer increased, the thickness of the Pr-Fe-B film could be enhanced without mechanical destruction. We had difficulty in exceeding the thickness of 100 μm in Nd-Fe-B films. Moreover, the (BH)max value of a 127-μm-Thick Pr-Fe-B film was higher by approximately 30 kJ m-3 than that of a 92-μm-Thick Nd-Fe-B film. The obtained results suggest that a Pr-Fe-B thick-film magnet is more suitable for MEMS applications., Japanese Journal of Applied Physics, 59(SE), art.no.SEEE01; 2020},
 title = {Comparison of properties between Pr-Fe-B and Nd-Fe-B thick-film magnets applied to MEMS},
 volume = {59},
 year = {2019}
}