{"created":"2023-05-15T16:34:43.535613+00:00","id":7441,"links":{},"metadata":{"_buckets":{"deposit":"977f7be9-21bb-42a0-b032-70c11e635de3"},"_deposit":{"created_by":2,"id":"7441","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"7441"},"status":"published"},"_oai":{"id":"oai:nagasaki-u.repo.nii.ac.jp:00007441","sets":["14:65"]},"author_link":["31253","31250","31249","31251","31252"],"item_9_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2010-06","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"1731","bibliographicPageStart":"1728","bibliographicVolumeNumber":"654-656","bibliographic_titles":[{"bibliographic_title":"Materials Science Forum"}]}]},"item_9_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Co/Cu multilayered nanowires with 40 nm in diameter were fabricated using a pulsed current deposition technique into a nanoporous template with numerous nanochannels. To determine the optimum electrodeposition condition of Cu and Co into the template, cathodic polarization behavior was examined at a wide range of cathode potential. Time-dependence of deposition current was monitored to determine the growth rate of Co and Cu nanowires. Co layer and Cu layer thicknesses were adjusted to several tens nanometers, by controlling the deposition times. With decreasing the each layer thickness, the coercive force of Co/Cu multilayered nanowires was decreased and the soft magnetic property was improved.","subitem_description_type":"Abstract"}]},"item_9_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"7th Pacific Rim International Conference on Advanced Materials and Processing, PRICM-7; Cairns, QLD; Australia; 2 August 2010 ～ 6 August 2010","subitem_description_type":"Other"}]},"item_9_description_63":{"attribute_name":"引用","attribute_value_mlt":[{"subitem_description":"Materials Science Forum, 654-656, pp.1728-1731; 2010","subitem_description_type":"Other"}]},"item_9_publisher_33":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Trans Tech Publications"}]},"item_9_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"10.4028/www.scientific.net/MSF.654-656.1728","subitem_relation_type_select":"DOI"}}]},"item_9_rights_13":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"© 2010 Trans Tech Publications"}]},"item_9_source_id_8":{"attribute_name":"EISSN","attribute_value_mlt":[{"subitem_source_identifier":"16629752","subitem_source_identifier_type":"ISSN"}]},"item_9_version_type_16":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Ohgai, Takeshi"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Hashiguchi, Keisuke"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Morimura, Takao"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Takao, Keizo"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kagawa, Akio"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-12-21"}],"displaytype":"detail","filename":"MSF654_1728.pdf","filesize":[{"value":"160.5 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"MSF654_1728.pdf","url":"https://nagasaki-u.repo.nii.ac.jp/record/7441/files/MSF654_1728.pdf"},"version_id":"ae19110e-0549-4e58-a5f7-b3e82ccd22f2"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Electro-Deposition","subitem_subject_scheme":"Other"},{"subitem_subject":"Membrane","subitem_subject_scheme":"Other"},{"subitem_subject":"Multilayer","subitem_subject_scheme":"Other"},{"subitem_subject":"Nanochannel","subitem_subject_scheme":"Other"},{"subitem_subject":"Nanowire","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference paper","resourceuri":"http://purl.org/coar/resource_type/c_5794"}]},"item_title":"Fabrication of Co/Cu Multilayered Nanowires Using a Pulsed Current Deposition Technique","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Fabrication of Co/Cu Multilayered Nanowires Using a Pulsed Current Deposition Technique"}]},"item_type_id":"9","owner":"2","path":["65"],"pubdate":{"attribute_name":"公開日","attribute_value":"2013-06-14"},"publish_date":"2013-06-14","publish_status":"0","recid":"7441","relation_version_is_last":true,"title":["Fabrication of Co/Cu Multilayered Nanowires Using a Pulsed Current Deposition Technique"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-05-16T02:24:24.595874+00:00"}