Substrate energy flux in the inductively coupled plasma (ICP) assisted magnetron discharge has been measured by using a home-made thermal probe. The energy flux depends predominantly on the ICP power. In addition, substrate bias dependence of the substrate energy flux has been measured. As a result, it has been confirmed that the measured heat influx in an ICP is in good agreement with the theoretically calculated value within 30% error. Thus, substrate energy flux during the ICP assisted sputtering is quantitatively clarified.
内容記述
2010 IEEE Region 10 Conference (TENCON 2010) : Fukuoka, 2010.11.21-2010.11.24